OFH-4100 OFH-4100

OFH-4100 Series

50〜300mm Alignment Vacuum

For wafers from 50 to 300mm
Aligner compatible with high-speed alignment

Features

  • Suction holding type aligner that boasts the industry's fastest alignment time.
  • Capable of multiple-size wafer alignment by command.
  • Can stop the orientation flat portion and notch portion at the designated position.
  • Alignment of quartz wafers is also available.

Operation flow

動作の流れ

Specifications*1

Model OFH-4100 OFH-4101 OFH-4102 OFH-4103
Applicable Wafer Size (※1) 200-300mm 150-200mm 100-200mm 50-150mm
Repeatability XY:±0.1mm、θ:±0.2°
Alignment Time 1.8sec. (※2)
Cleanliness ISO Class 3 (ISO-14644)
Mass 8kg
Utilities Vacuum -80KPag or less, 10NL/min
Power supply 24 VDC 3A
Environment Temperature 15-25℃
Humidity 60% or less (No condensation)

※1 The OFH-4100Q series is available for quartz wafers. Contact us for details.
※2 In the case of a 50mm wafer, the alignment time is 2.5 sec.

OFH-4100
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EG-303 EG-303

EG-303 Series

50〜300mm Alignment Vacuum

For 300mm wafers
Edge grip type aligner never makes
contact with wafer back sides

Features

  • High-precision centering by the edge grip method using three movable claws.
  • The optional buffer port minimizes the waiting time of the robot during alignment.
  • Can stop the notch portion at the designated position.
  • Command option to move the wafer ID portion to a customer-prepared camera position.
特徴図

Operation flow

動作図

1. Turn on the power.

By the “return to origin” command, the EG moves the arm section to the “position where a transfer robot can place and remove wafers on/from the EG.”

2. Place a pre-alignment wafer on the wafer station using a transfer robot.

3. For reading the wafer ID on the EG, execute the “move to OCR position” command.

The EG aligns the wafer with the “OCR readout angle” and moves it to the “OCR position.” Perform OCR readout operation with your system.

4. Execute the “alignment” command.

The EG aligns the wafer with the “alignment angle” and places it on the wafer station. After that, the EG moves the arm section to the position where the transfer robot can access the EG.

5. Remove the aligned wafer from the wafer station using the transfer robot.

Specifications

Model EG-303
Applicable Wafer Size 300mm
Repeatability High Accuracy Mode XY: ±0.05mm θ: ±0.075°
Normal Mode XY: ±0.2mm θ: ±0.1°
Alignment Time High Accuracy Mode Average 7.5sec.
Normal Mode Average 3.5sec.
Cleanliness ISO Class 3 (ISO-14644)
Mass 7kg
Utilities Power supply 24 VDC 3A
Environment Temperature 0-40℃
Humidity 70% or less (No condensation)
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