Advantages of introducing clean transfer robot ACTRANS
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For wafers from 50 to 300mm
Aligner compatible with high-speed alignment
Model | OFH-4100 | OFH-4101 | OFH-4102 | OFH-4103 | |
---|---|---|---|---|---|
Applicable Wafer Size (※1) | 200-300mm | 150-200mm | 100-200mm | 50-150mm | |
Repeatability | XY:±0.1mm、θ:±0.2° | ||||
Alignment Time | 1.8sec. (※2) | ||||
Cleanliness | ISO Class 3 (ISO-14644) | ||||
Mass | 8kg | ||||
Utilities | Vacuum | -80KPag or less, 10NL/min | |||
Power supply | 24 VDC 3A | ||||
Environment | Temperature | 15-25℃ | |||
Humidity | 60% or less (No condensation) |
※1 The OFH-4100Q series is available for quartz wafers. Contact us for details.
※2 In the case of a 50mm wafer, the alignment time is 2.5 sec.
For 300mm wafers
Edge grip type aligner never makes
contact with wafer back sides
By the “return to origin” command, the EG moves the arm section to the “position where a transfer robot can place and remove wafers on/from the EG.”
The EG aligns the wafer with the “OCR readout angle” and moves it to the “OCR position.” Perform OCR readout operation with your system.
The EG aligns the wafer with the “alignment angle” and places it on the wafer station. After that, the EG moves the arm section to the position where the transfer robot can access the EG.
Model | EG-303 | |
---|---|---|
Applicable Wafer Size | 300mm | |
Repeatability | High Accuracy Mode | XY: ±0.05mm θ: ±0.075° |
Normal Mode | XY: ±0.2mm θ: ±0.1° | |
Alignment Time | High Accuracy Mode | Average 7.5sec. |
Normal Mode | Average 3.5sec. | |
Cleanliness | ISO Class 3 (ISO-14644) | |
Mass | 7kg | |
Utilities | Power supply | 24 VDC 3A |
Environment | Temperature | 0-40℃ |
Humidity | 70% or less (No condensation) |